четверг, 13 февраля 2014 г.

Rising Complexity of CMOS Technology

(from "Collaboration as a Way forward for Semiconductor Technology – Albany NanoTech" by Dr. Gary Patton, Vice President, IBM Semiconductor Research & Development Center, IEEE Fellow)

High-K Gate dielectrics

 

(from dtfl.snu.ac.kr)

 Gate first vs. Gate last process

(from dtfl.snu.ac.kr)

See also

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